Nijmegen, Netherlands

Ludolf Postma


 

Average Co-Inventor Count = 4.9

ph-index = 1


Company Filing History:


Years Active: 2025

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2 patents (USPTO):Explore Patents

Title: Ludolf Postma: Innovator in Lithographic Technology

Introduction

Ludolf Postma is a notable inventor based in Nijmegen, Netherlands. He has made significant contributions to the field of lithographic technology, holding a total of 2 patents. His work focuses on apparatuses that enhance the handling and assembly of reticle components in lithographic processes.

Latest Patents

Postma's latest patents include an "Apparatus for assembly of a reticle assembly" and a "Substrate holder, lithographic apparatus and method." The first patent describes an object handling apparatus designed to grip and hold generally planar objects using two support arms. Each arm is equipped with support pads and aligners that apply forces to ensure proper handling of the object. The second patent outlines a substrate holder that supports a substrate within a lithographic apparatus. This holder features a main body, supporting pins, and an actuatable plate that enhances the stability and pressure management of the substrate.

Career Highlights

Ludolf Postma has established himself as a key figure in the lithographic technology sector. His innovative designs and patents have contributed to advancements in the efficiency and effectiveness of lithographic processes. He is currently associated with ASML Netherlands B.V., a leading company in the development of photolithography equipment.

Collaborations

Throughout his career, Postma has collaborated with notable colleagues, including André Schreuder and Gijs Kramer. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Ludolf Postma's contributions to lithographic technology through his patents and collaborations highlight his role as an influential inventor in the field. His work continues to impact the industry positively, paving the way for future advancements.

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