Asml Netherlands B.v.

Ludolf Postma

Derk Servatius Gertruda Brouns

Gijs Kramer

Pieter Renaat Maria Hennus

André Schreuder

Edward Hage

Ilya Malakhovsky

Johannes Charles Adrianus Van Den Berg

Joffrey Rene Sylvian Craquelin

Jan Willem Adriaan Oosterling

Marcel Duco Snel

Wouter Van Der Chijs

Bartel Joris Van Der Veek

Mike Johannes Antonius Van Kuijk

Marina Antoinetta Leonarda Van Uum-van Herk

Henricus Marinus Theodorus Wiersma

An object handling apparatus for handling a generally planar object, the object handling apparatus including: two support arms, at least one of the two support arms movable relative to another support arm generally in a plane such that the two support arms are operable to grip and hold an object disposed in the plane, wherein each of the support arms includes at least one support pad and at least one aligner, the support pads configured to locally contact a surface of the object and apply a force thereto generally perpendicular to the plane so as to support the object and the at least one aligner configured to locally contact a surface of the object and apply a force thereto generally in the plane so as to grip the object.

Apparatus for assembly of a reticle assembly

A substrate holder for supporting a substrate, a lithographic apparatus having the substrate holder and a method of supporting the substrate. The substrate holder includes a main body, a plurality of supporting pins, and a plate. The plate is positioned between a surface of the main body and a support surface formed by the plurality of supporting pins. The plate is actuatable in a direction along the plurality of supporting pins between the surface of the main body and the support surface. The substrate holder may also include a main body, a flexible member and a fixed member protruding from a surface of the main body. The flexible member defines an enclosed cavity therein and configured to form a seal with the substrate supported on the substrate holder. The substrate holder is configured to reduce pressure in the enclosed cavity of the flexible member.

Substrate holder, lithographic apparatus and method

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Nijmegen, Netherlands

Ludolf Postma