San Jose, CA, United States of America

Lucas S Chang

This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 1994.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Lucas S Chang. Retrieved from https://idiyas.com/inventor/lucas-s-chang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 28(Granted Patents)


Company Filing History:


Years Active: 1994

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Innovations by Lucas S Chang: Crafting Beveled Edges

Introduction

Lucas S Chang is a distinguished inventor based in San Jose, CA, known for his innovative processes in the field of material engineering. With a keen focus on enhancing structural designs, he has developed a patented process that significantly improves the generation of beveled edges in various materials. His contribution to technology underlines the importance of precision in manufacturing processes.

Latest Patents

Lucas holds a notable patent for a "Process for generating beveled edges." This invention details an improved method for creating structures with beveled edges, which is pivotal in numerous applications. The process involves the successive deposition of two photoresist layers onto a target material, such as a metallization film. The innovative technique allows for the development of deep recesses that remain intact during the etching process, leading to precisely defined edge profiles. This advancement in material processing technology has substantial implications for various industries.

Career Highlights

Currently, Lucas is affiliated with the International Business Machines Corporation (IBM), where he utilizes his skills to push the boundaries of technology and innovation. His role at IBM involves collaborating with a talented team dedicated to advancing engineering and manufacturing processes. His expertise and contributions have established him as an influential figure within the corporation.

Collaborations

Throughout his career, Lucas has worked alongside esteemed colleagues such as Jerome Michael Eldridge and Cherngye Hwang. Collaborating with such talented professionals has further enriched his experience and fostered a culture of innovation within their team at IBM. These partnerships are crucial in driving research and development efforts that lead to groundbreaking inventions in their field.

Conclusion

Lucas S Chang exemplifies the spirit of innovation with his contributions to the development of advanced manufacturing processes. Through his patent for generating beveled edges and his collaboration with talented individuals, he continues to make significant strides in the engineering sector. His work not only enhances product quality but also sets a benchmark for future innovations in materials processing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…