The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 04, 1994
Filed:
Dec. 18, 1992
Applicant:
Inventors:
Lucas S Chang, San Jose, CA (US);
Jerome M Eldridge, Los Gatos, CA (US);
Cherngye Hwang, San Jose, CA (US);
James H Lee, San Jose, CA (US);
Tiee-Ghow Wang, San Jose, CA (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C / ; C23F / ;
U.S. Cl.
CPC ...
1566611 ; 156656 ; 156904 ;
Abstract
Improved processes for generating a structure having beveled edges are presented. In a preferred embodiment, two photoresist layers are successively deposited on top of the target material, e.g., a metallization film. The intermediate photoresist layer is developed beyond the lithographically delineated boundaries of the top photoresist layer, forming deep recesses. These recesses remain unchanged during the subsequent etching step, resulting in pre-defined edge profiles in the target material.