This inventor holds 1 USPTO granted patent. Top assignee: Hitachi High-Tech Corporation. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Lucas Kovatch and Plasma Processing Innovation
Introduction
Lucas Kovatch is an inventor based in Hillsboro, Oregon, whose patent work concerns plasma processing. His disclosed invention addresses the etching of ruthenium-containing films.
Latest Patents
Kovatch is associated with 1 patent, titled “Plasma Processing Method.” The patent describes alternating two etching steps: first, a halogen-containing plasma forms a modified layer on the ruthenium-containing film; then, a plasma generated from an oxygen-containing gas desorbs that layer. Repeating the steps provides the method for processing the film.
Career Highlights
Kovatch is associated with Hitachi High-Tech Corporation. His patent reflects work on plasma-based techniques for etching materials used in advanced manufacturing.
Collaborations
Kovatch’s listed coworkers include Yohei Ishii and Kathryn Maier.
Conclusion
Lucas Kovatch’s patent documents a plasma-processing approach that alternates surface modification and desorption to etch ruthenium-containing films.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile