The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 2026
Filed:
Sep. 13, 2023
Hitachi High-tech Corporation, Tokyo, JP;
Yohei Ishii, Hillsboro, OR (US);
Kathryn Maier, Hillsboro, OR (US);
Lucas Kovatch, Hillsboro, OR (US);
Makoto Miura, Tokyo, JP;
Hitachi High-Tech Corporation, Tokyo, JP;
Abstract
A plasma processing method of etching a ruthenium-containing film using a first etching process (S) and a subsequent second etching process (S). Scomprises a first step (S) where a modified layer is formed on the surface of the ruthenium-containing film using a halogen element-containing plasma, and a following second step (S) to desorb the modified layer using a plasma generated with an oxygen element-containing gas; Sand Sare repeated alternately.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile