Voinsles, France

Luc Van Autryve



Average Co-Inventor Count = 1.6

ph-index = 3

Forward Citations = 60(Granted Patents)


Location History:

  • St. Cloud, FR (1999)
  • Voinsles, FR (2000)
  • Mennecy, FR (2003)

Company Filing History:


Years Active: 1999-2003

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3 patents (USPTO):Explore Patents

Title: Innovations by Luc Van Autryve

Introduction

Luc Van Autryve is a notable inventor based in Voinsles, France. He has made significant contributions to the field of semiconductor processing, holding a total of 3 patents. His work focuses on methods that enhance the efficiency and effectiveness of etching processes in semiconductor manufacturing.

Latest Patents

One of his latest patents is a method of etching platinum using a silicon carbide mask. This innovative method involves providing an etch stack that includes a patterned silicon carbide layer over a layer of platinum. The process utilizes a plasma generated from a source gas comprising Cl, BCl, and a nonreactive diluent gas. The silicon carbide mask can be easily deposited and patterned using standard industry techniques, and it can be removed without damaging the platinum or an underlying doped substrate material. This method results in a smooth platinum etch profile with an etch profile angle of about 75° to about 90°. Another significant patent involves localizing cleaning plasma for semiconductor processing. This process allows for etching a substrate in a process chamber while maintaining the integrity of the chamber's sidewalls. It includes a localized cleaning stage that effectively cleans process residues without extending the cleaning plasma sheath to the sidewalls.

Career Highlights

Luc Van Autryve is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work has been instrumental in advancing techniques that improve semiconductor fabrication processes. His innovative approaches have garnered attention and recognition within the industry.

Collaborations

Luc has collaborated with notable coworkers such as Stefan Oswald Lang and Chentsau Chris Ying. These collaborations have contributed to the development of advanced technologies in semiconductor processing.

Conclusion

Luc Van Autryve's contributions to the field of semiconductor processing through his innovative patents demonstrate his expertise and commitment to advancing technology. His work continues to influence the industry positively.

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