The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 18, 2000
Filed:
Jun. 22, 1998
Luc Van Autryve, Voinsles, FR;
Stefan Oswald Lang, Holzgerlingen, DE;
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A process for etching a substrate 20 in a process chamber 25 having sidewalls 30 and a sacrificial collar 100, and for cleaning the sacrificial collar without eroding or otherwise damaging the sidewalls. The process comprises an etching stage in which a substrate 20 is placed in the process chamber 25, and the sacrificial collar 100 is maintained around the substrate to add or remove species from a process gas to affect a processing rate of the substrate periphery. The process further comprises a localized cleaning stage in which the substrate 20 is removed, a cleaning gas introduced into the process chamber 25, and a localized cleaning plasma sheath 95 is formed to clean process residues formed on the sacrificial collar 100 substantially without extending the localized cleaning plasma sheath 95 to the sidewalls 30 of the process chamber.