Quebec, Canada

Luc Bélanger

This inventor holds 1 USPTO granted patent. Top assignee: Ciena Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Luc Bélanger. Retrieved from https://idiyas.com/inventor/luc-belanger-o3j24he1

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Luc Bélanger: Innovator in Photonic Structures

Introduction: Luc Bélanger is a notable inventor based in Quebec, Canada. He has made significant contributions to the field of photonics, particularly in managing adhesive materials through innovative shaping techniques. His work is characterized by a focus on integrating advanced technologies into practical applications.

Latest Patents: Luc Bélanger holds a patent for "Managing adhesive material shaping using structure arrays." This invention involves an article of manufacture that includes a portion of a wafer with a substrate and multiple layers. It features integrated photonic structures associated with electromagnetic wave propagation regions. The design incorporates an array of liquid guiding structures arranged in a two-dimensional pattern, along with an adhesive material that interacts with these structures.

Career Highlights: Luc Bélanger is currently employed at Ciena Corporation, a leading company in the field of networking and telecommunications. His role involves leveraging his expertise in photonics to develop cutting-edge solutions that enhance communication technologies.

Collaborations: Luc collaborates with Nicolas Boyer, a fellow innovator, to further advance their research and development efforts in the field of photonics.

Conclusion: Luc Bélanger's contributions to the field of photonics through his innovative patent and collaboration with industry professionals highlight his role as a key figure in advancing technology. His work continues to influence the development of new applications in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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