Luc Albarede

This inventor holds 21 USPTO granted patents and 6 published patent applications, primarily in Plasma Etching Technology. Top assignee: Lam Research Corporation. Active years: 2012-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Luc Albarede. Retrieved from https://idiyas.com/inventor/luc-albarede

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 21 (Patent Applications = 6)

% Patents Active = 85.7

Average Co-Inventor Count = 2.7

ph-index = 5

Forward Citations = 97(Granted Patents)

Company Filing History:

21 out of 3,945

Lam Research Corporation

patents

Years Active: 2012-2026

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Areas of Expertise:

RF Pulsing

Phased Array Antennas

Plasma Etching

Process Rate

Etch Rate Uniformity

Predictive Maintenance

Impedance Control

Optical Cavity

Empirical Mode Decomposition

Gas Exhaust Measurement

Chamber Matching

Plasma Processing

21 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12695059 - Synchronization of RF pulsing schemes and of sensor data collection (2026-07-28),

2. 12580325 - Phased array antennas and methods for controlling uniformity in processing a substrate (2026-03-17),

3. 11056322 - Method and apparatus for determining process rate (2021-07-06),

4. 10930478 - Apparatus with optical cavity for determining process rate (2021-02-23),

5. 10903050 - Endpoint sensor based control including adjustment of an edge ring parameter for each substrate processed to maintain etch rate uniformity (2021-01-26),

6. 10784174 - Method and apparatus for determining etch process parameters (2020-09-22),

7. 10504704 - Plasma etching systems and methods using empirical mode decomposition (2019-12-10),

8. 10302553 - Gas exhaust by-product measurement system (2019-05-28),

9. 10249476 - Control of impedance of RF return path (2019-04-02),

10. 10157730 - Control of impedance of RF delivery path (2018-12-18),

11. 10134569 - Method and apparatus for real-time monitoring of plasma chamber wall condition (2018-11-20),

12. 9735069 - Method and apparatus for determining process rate (2017-08-15),

13. 9548189 - Plasma etching systems and methods using empirical mode decomposition (2017-01-17),

14. 9401264 - Control of impedance of RF delivery path (2016-07-26),

15. 9337000 - Control of impedance of RF return path (2016-05-10),

Title: Luc Albarede: Innovator in Substrate Processing Technologies

Introduction

Luc Albarede is a prominent inventor based in Fremont, California, with an impressive portfolio of 19 patents. His work primarily focuses on advancements in dry processing methods for substrates within various industrial applications. Albarede's innovative contributions are particularly notable in the field of process rate determination, where he employs cutting-edge technology to enhance operational efficiency.

Latest Patents

Among Luc Albarede's latest patents is a groundbreaking method and apparatus for determining process rates. This method involves dry processing a substrate in a processing chamber, where the substrate is subjected to dry processing that results in the creation of at least one gas byproduct. Through precise measurement of the concentration of this gas byproduct, users can effectively determine the processing rate of the substrate.

Another significant patent covers an apparatus specifically designed for substrate processing. This innovative system includes a processing chamber and a substrate support, along with a gas inlet that facilitates the introduction of process gas into the chamber. Within this apparatus, a parameter measurement system features a cavity ring down device, which is instrumental in measuring various processing parameters reliably.

Career Highlights

Luc Albarede's career is marked by his tenure at Lam Research Corporation, where he has made substantial contributions to substrate processing technologies. His experience and expertise in this field have not only led to numerous patents but have also established him as a key figure in advancing manufacturing processes.

Collaborations

In his professional journey, Luc collaborates with notable colleagues, including Yassine Kabouzi and Alexei Marakhtanov. Their joint efforts reflect a synergy of creativity and technical proficiency, allowing for mutual enhancement of their innovative projects and patents.

Conclusion

Luc Albarede stands out as a significant inventor with a wealth of experience and expertise in substrate processing technologies. With 19 patents to his name, his latest innovations continue to drive progress in the industry, showcasing his commitment to enhancing efficiency and effectiveness in manufacturing processes. Through his work at Lam Research Corporation and collaborations with talented peers, Albarede's contributions are set to have a lasting impact on the field.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

6 patents pending: