Company Filing History:
Years Active: 1991-1992
Title: Loyal R. Gibbons: Innovator in Integrated Circuit Processing
Introduction
Loyal R. Gibbons is a notable inventor based in Boise, ID (US), recognized for his contributions to the field of integrated circuit processing. With a total of 2 patents, Gibbons has made significant advancements in the technology used for etching and rinsing integrated circuit wafers.
Latest Patents
Gibbons' latest patents include the Hydrofluoric Acid Etcher and Cascade Rinser, which is an apparatus designed to HF gas etch multiple integrated circuit wafers within an etch chamber. This innovative device also features a de-ionized water cascade rinse that occurs in the same chamber. Upon completion of the rinse and removal of the wafer carriers, the apparatus is purged with an inert gas, preparing it for the next batch of wafer carriers. The apparatus is equipped with process-control means that automatically manage each step of the etching and rinsing process. Another significant patent is the Wafer Rinser/Dryer, which introduces improvements to an integrated circuit wafer rinsing and washing machine. This includes a streamlined housing for low turbulence air flow, enhanced rear maintenance capability, improved wafer carriers, foot-operated switches, and better fastening means for rotating parts.
Career Highlights
Gibbons is currently employed at Micron Technology Incorporated, where he continues to innovate and contribute to the advancement of semiconductor technology. His work has been instrumental in improving the efficiency and effectiveness of wafer processing.
Collaborations
Throughout his career, Gibbons has collaborated with talented individuals such as Navjot Chhabra and Bryan J. Ludwig, further enhancing the innovative environment at Micron Technology.
Conclusion
Loyal R. Gibbons stands out as a key figure in the realm of integrated circuit processing, with his patents reflecting a commitment to innovation and excellence. His contributions continue to shape the future of semiconductor technology.