Micron Technology Incorporated

Loyal R Gibbons

David A Cathey

Navjot Chhabra

L Brian Dunn

Ernest E Marks

Bryan J Ludwig

Leo B Jurica

An apparatus used to HF gas etch a plurality of integrated circuit wafers within an etch chamber, followed by a de-ionized water cascade rinse in the chamber. On completion of the rinse and removal of the wafer carriers, the apparatus, housing, and supply conduits are purged with an inert gas to prepare the apparatus for a next batch of wafer carriers. The apparatus includes process-control means for automatically controlling each step of the process.

Hydrofluoric acid etcher and cascade rinser

Improvements to an integrated circuit wafer rinsing and washing machine which include a streamlined housing for low turbulence air flow, improved rear maintenance capability, improved wafer carriers, foot operated switches and improved rotating part fastening means.

Wafer rinser/dryer

Growing community of inventors

Boise, ID, United States of America

Loyal R Gibbons