San Francisco, CA, United States of America

Louis Yang


Average Co-Inventor Count = 3.4

ph-index = 3

Forward Citations = 54(Granted Patents)


Company Filing History:


Years Active: 2004-2008

where 'Filed Patents' based on already Granted Patents

5 patents (USPTO):

Title: The Innovative Contributions of Louis Yang

Introduction

Louis Yang is a prominent inventor based in San Francisco, CA, recognized for his significant contributions to the field of materials science and engineering. With a collection of five patents to his name, Yang has been instrumental in advancing the technology surrounding low k barrier layers, which are essential in modern semiconductor manufacturing.

Latest Patents

Among his latest innovations, Louis Yang has developed a method for depositing low k barrier layers. This method involves providing a processing gas that includes an organosilicon compound containing a phenyl group, which is then reacted to deposit a low k silicon carbide barrier layer. This barrier layer is crucial for applications in damascene or dual damascene processes involving low k dielectric materials, helping to enhance performance and efficiency in semiconductor devices.

Career Highlights

Yang is currently employed at Applied Materials, Inc., a leading company in the fields of materials engineering and semiconductor manufacturing. His work has helped propel the company to the forefront of innovation in the materials science sector. With a strong foundation in research and a commitment to pushing the boundaries of technology, Yang has become a key figure in his organization.

Collaborations

Throughout his career, Louis Yang has collaborated with esteemed colleagues such as Li-Qun Xia and Ping Xu. These partnerships have fostered a collaborative environment that promotes innovation and the successful execution of groundbreaking projects aimed at enhancing semiconductor technology.

Conclusion

Louis Yang's contributions to the field of semiconductor materials continue to pave the way for advancements in technology. His work, particularly in the development of low k barrier layers, is vital for the future of semiconductor manufacturing. As technology evolves, Yang’s innovations will undoubtedly play a crucial role in shaping the industry and the devices of tomorrow.

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