Hamburg, NY, United States of America

Louis G Anello


Average Co-Inventor Count = 2.5

ph-index = 5

Forward Citations = 77(Granted Patents)


Company Filing History:


Years Active: 1978-1988

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20 patents (USPTO):Explore Patents

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Title: Louis G Anello - Pioneering Innovations in Integrated Circuits and Urease Inhibition

Introduction:

Louis G Anello, a prolific inventor based in Hamburg, NY, is known for his remarkable contributions to the fields of integrated circuits and urease inhibition. With an impressive portfolio of 20 patents, Anello has left a significant impact on the technology landscape.

Latest Patents:

One of his recent patents titled "Cyclosilazane polymers as dielectric films in integrated circuit" showcases an innovative method for depositing dielectric films in the fabrication of integrated circuits. This technique employs polymers derived from cyclosilazanes to create highly uniform and continuous deposition of metallization layers, enhancing the yield and reliability of ICs. Another notable patent is "S-aryl and S-aliphatic diamidophosphorothiolates as urease inhibitors," introducing novel compounds for inhibiting urease activity in fertilizer compositions.

Career Highlights:

Anello has held key roles at Allied Corporation and Allied Chemical Corporation, where his expertise and inventive spirit have driven groundbreaking advancements in semiconductor technology and agricultural sciences. His inventive prowess has led to the successful implementation of novel solutions in complex industry challenges.

Collaborations:

Throughout his career, Anello has collaborated with esteemed professionals such as Richard F Sweeney and Michael Van Der Puy. Their collective efforts have resulted in the development of groundbreaking technologies and innovations that have reshaped industries and improved operational efficiencies.

Conclusion:

Louis G Anello's relentless pursuit of innovation and commitment to excellence have positioned him as a visionary in the realms of integrated circuits and urease inhibition. His pioneering work continues to inspire future generations of inventors and engineers, leaving a lasting legacy in the world of technology and scientific advancements.

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