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For the Inventor, By the Inventor

Clearwater, FL, United States of America

Louis Fierro

This inventor holds 4 USPTO granted patents. Top assignee: Nordson Corporation. Active years: 2012-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Louis Fierro. Retrieved from https://idiyas.com/inventor/louis-fierro

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 4

Average Co-Inventor Count = 3.3

ph-index = 2

Forward Citations = 13(Granted Patents)


Company Filing History:

goldMedal4 out of 1,741 
 
Nordson Corporation
 patents

Years Active: 2012-2018

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4 patents (USPTO):Explore Patents
1. 10109448 - Multiple-electrode plasma processing systems with confined process chambers and interior-bussed electrical connections with the electrodes (2018-10-23),
2. 8372238 - Multiple-electrode plasma processing systems with confined process chambers and interior-bussed electrical connections with the electrodes (2013-02-12),
3. 8333166 - Plasma treatment systems and methods for uniformly distributing radiofrequency power between multiple electrodes (2012-12-18),
4. 8226795 - Magnetic clips and substrate holders for use in a plasma processing system (2012-07-24),

Title: Innovations of Louis Fierro

Introduction

Louis Fierro is a notable inventor based in Clearwater, FL (US). He has made significant contributions to the field of plasma processing systems, holding a total of 4 patents. His work focuses on developing advanced apparatuses for treating products with plasma generated from a source gas.

Latest Patents

Fierro's latest patents include multiple-electrode plasma processing systems with confined process chambers and interior-bussed electrical connections with the electrodes. The apparatus features a vacuum chamber and a plurality of juxtaposed electrodes arranged in adjacent pairs inside the vacuum chamber. A plasma excitation source is electrically coupled with the electrodes, enhancing the efficiency of the plasma treatment process. The design incorporates conductive members extending into the interior of each electrode to establish electrical connections with the plasma excitation source. Additionally, the apparatus includes a gas distribution manifold and multiple gas delivery tubes, each equipped with injection ports to inject the source gas between adjacent pairs of electrodes. Flow restricting members are also included to partially obstruct the peripheral gap between each adjacent pair of electrodes, effectively restricting the escape of the source gas from the process chamber.

Career Highlights

Louis Fierro is currently employed at Nordson Corporation, where he continues to innovate in the field of plasma processing technology. His work has been instrumental in advancing the capabilities of plasma treatment systems, making them more efficient and effective for various applications.

Collaborations

Fierro has collaborated with notable coworkers such as James Donald Getty and Thomas V Bolden, contributing to the development of cutting-edge technologies in their field.

Conclusion

Louis Fierro's contributions to plasma processing systems exemplify the spirit of innovation in engineering. His patents and ongoing work at Nordson Corporation highlight his commitment to advancing technology in this specialized area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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