The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 18, 2012
Filed:
May. 04, 2011
Thomas V. Bolden, Ii, Fremont, CA (US);
Elmer M. Calica, Antioch, CA (US);
Robert S. Condrashoff, Concord, CA (US);
Louis Fierro, Clearwater, FL (US);
James D. Getty, Vacaville, CA (US);
Thomas V. Bolden, II, Fremont, CA (US);
Elmer M. Calica, Antioch, CA (US);
Robert S. Condrashoff, Concord, CA (US);
Louis Fierro, Clearwater, FL (US);
James D. Getty, Vacaville, CA (US);
Nordson Corporation, Westlake, OH (US);
Abstract
Plasma treatment systems and methods for distributing RF energy to electrodes in a plasma treatment system. The plasma treatment system includes power and ground busses, positive and negative phase primary electrode busses, and positive and negative phase secondary electrode busses. The power and ground busses are coupled to the secondary electrode busses by isolation transformers so that the negative phase secondary electrode buss is provided with an RF signal that is 180 degrees out of phase with the RF signal supplied to the positive phase secondary electrode buss. The secondary electrode busses are coupled to respective positive and negative phase primary electrode busses by capacitors. The primary electrode busses are each coupled to electrodes in the vacuum chamber. Load coils coupling the primary electrode busses to an RF ground may cooperative with the capacitors to adjust the input impedance at the power buss.