Munich, Germany

Lothar Andritzke

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Hap Handhabungs-, Automatisierungs- Und Präzisionstechnik Gmbh. Active years: 2012.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: Lothar Andritzke: Innovator in Photolithographic Technology

Introduction

Lothar Andritzke is a notable inventor based in Munich, Germany. He has made significant contributions to the field of photolithography, particularly through his innovative patent that addresses the removal of pellicles from masks. His work is essential for enhancing the efficiency and effectiveness of photolithographic processes.

Latest Patents

Lothar Andritzke holds a patent for an "Apparatus and method for the removal of pellicles from masks." This invention provides a universal solution for removing pellicles from masks used in photolithography without causing contamination or damage. The apparatus features at least one grip for manipulating masks, equipped with two fixing elements that apply pressure at the mask's edge. Additionally, it includes a detector for contactless position determination of mounts at the pellicle's outer edge and a heating device for adhesive used in securing pellicles to masks. The removal apparatus consists of a mask fixing unit and a pellicle removal unit, showcasing a comprehensive approach to this technical challenge.

Career Highlights

Lothar Andritzke is associated with Hap Handhabungs-, Automatisierungs- und Präzisionstechnik GmbH, where he applies his expertise in automation and precision technology. His innovative spirit and technical knowledge have positioned him as a key player in his field.

Collaborations

Lothar collaborates with talented professionals such as Holger Brosche and Steffen Krueger. Their combined efforts contribute to advancing technology in their industry.

Conclusion

Lothar Andritzke's contributions to photolithographic technology through his innovative patent demonstrate his commitment to improving industrial processes. His work continues to influence the field and showcases the importance of innovation in technology.

Profile summary based on public USPTO records.
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