Heidelberg, Germany

Lorenz Niederberger

This inventor holds 1 USPTO granted patent and 1 published patent application and 2 EPO patents. Top assignee: Forschungszentrum Karlsruhe Gmbh. Active years: 2009.

USPTO Granted Patents = 1 

% Patents Active = 100.0


Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Lorenz Niederberger: Innovator in Plasma Technology

Introduction

Lorenz Niederberger is a notable inventor based in Heidelberg, Germany. He has made significant contributions to the field of plasma technology, particularly through his innovative patent. His work focuses on generating local electron-cyclotron microwave low-pressure plasma, which has applications in various processing chambers.

Latest Patents

Niederberger holds a patent for a "System for generating a local electron-cyclotron microwave low-pressure plasma at a predetermined location within a processing chamber." This invention involves an arrangement that utilizes a microwave supply means to provide a microwave beam and a plasma localization unit to generate a magnetic field. The intersection of the magnetic field and the microwave beam within the process chamber allows for precise control over the conditions for electron cyclotron resonance. The design includes a movable magnetic field arrangement along the microwave beam axis, enabling adjustable cross volumes for enhanced plasma generation.

Career Highlights

Throughout his career, Lorenz Niederberger has worked with esteemed organizations such as Forschungszentrum Karlsruhe GmbH and Karlsruhe Institute of Technology. His experience in these institutions has allowed him to develop and refine his innovative ideas in plasma technology.

Collaborations

Niederberger has collaborated with notable colleagues, including Martina Lattemann and Sven Ulrich. These partnerships have contributed to the advancement of his research and the successful implementation of his inventions.

Conclusion

Lorenz Niederberger's contributions to plasma technology through his innovative patent demonstrate his expertise and commitment to advancing the field. His work continues to influence the development of new technologies in processing chambers.

Profile summary based on public USPTO records.
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