The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2009
Filed:
May. 17, 2004
Sven Ulrich, Stutensee, DE;
Michael Stüber, Landau, DE;
Harald Leiste, Weingarten, DE;
Lorenz Niederberger, Heidelberg, DE;
Konrad Sell, Karlsruhe, DE;
Martina Lattemann, Tubingen, DE;
Roland Loos, Furtwangen, DE;
Sven Ulrich, Stutensee, DE;
Michael Stüber, Landau, DE;
Harald Leiste, Weingarten, DE;
Lorenz Niederberger, Heidelberg, DE;
Konrad Sell, Karlsruhe, DE;
Martina Lattemann, Tubingen, DE;
Roland Loos, Furtwangen, DE;
Forschungszentrum Karlsruhe GmbH, Karlsruhe, DE;
Abstract
In an arrangement for generating a local electron-cyclotron-microwave-low pressure plasma at a certain location within a gas-filled process chamber, a microwave supply means providing a microwave beam and a plasma localization unit generating a magnetic field are provided such that the magnetic field and the microwave beam intersect each other in the process chamber. The microwaves are uncoupled onto a concave reflection structure from the focal point thereof so that the microwave beam generated is essentially parallel. An arrangement for generating a magnetic field is movable along the microwave beam axis so that a cross volume between the microwave beam and the magnetic field can be moved along the beam axis whereby the conditions for electron cyclotron resonance are adjustable by displacement of the magnetic field.