Long Shih Lin

Title: Innovations by Long Shih Lin

Introduction

Long Shih Lin is a notable inventor based in Jhubei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding three patents that showcase his innovative spirit and technical expertise. His work primarily focuses on the development of advanced electronic devices and processes.

Latest Patents

One of Long Shih Lin's latest patents is a Schottky device and process of making the same comprising a geometry gap. This invention provides a Schottky device that includes a substrate, a deep well, a Schottky contact, and an Ohmic contact. The substrate is doped with a first type of ions, while the deep well is doped with a second type of ions. The Schottky contact interfaces with a first electrode connected to the deep well, and the Ohmic contact connects a second electrode to a heavily doped region within the deep well. The geometry gap formed under the Schottky contact allows for adjustments to the breakdown voltage, enhancing the device's performance.

Another significant patent is for an integrated circuit with a high voltage junction structure. This high voltage integrated circuit features a P substrate with an N well barrier. The design includes separated P diffusion regions that form P wells, serving as isolation structures. A low voltage control circuit is positioned outside the N well barrier, while a floating circuit is located within it. This configuration aims to develop a high voltage junction barrier between the floating circuit and the substrate, optimizing the device's functionality.

Career Highlights

Long Shih Lin is currently employed at System General Corporation, where he continues to push the boundaries of semiconductor technology. His work has been instrumental in advancing the capabilities of integrated circuits and electronic devices.

Collaborations

Throughout his career, Long has collaborated with talented individuals such as Chiu-Chih Chiang and Chih-Feng Huang. These partnerships have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Long Shih Lin's contributions to the field of semiconductor technology through his patents and collaborations highlight his role as a leading inventor. His innovative designs and processes continue to influence the industry and pave the way for future advancements.