Liying Liu

Title: Innovations by Liying Liu in Temperature Detection Technology

Introduction

Liying Liu is an accomplished inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, particularly in methods for detecting temperature in thermal chambers. With a total of three patents to his name, Liu's work is recognized for its efficiency and accuracy.

Latest Patents

Liying Liu's latest patent focuses on a method for detecting the temperature of a thermal chamber. This innovative application involves conducting a thermal treatment at a predicted temperature to a selected silicon wafer within the thermal chamber. The process includes obtaining a haze value corresponding to the predicted temperature and establishing a linear relationship between temperature and haze. After polishing and washing the silicon wafer, a second thermal treatment is conducted, allowing for the calculation of the actual temperature difference of the thermal chamber based on the haze difference. This method enhances the efficiency and accuracy of temperature detection, reduces fluctuations caused by silicon wafer thickness and resistivity, increases the utilization of silicon wafers, and ultimately lowers costs.

Career Highlights

Liying Liu is currently employed at Zing Semiconductor Corporation, where he continues to innovate in the semiconductor industry. His work has garnered attention for its practical applications and contributions to improving manufacturing processes.

Collaborations

Liying Liu collaborates with talented individuals such as Gongbai Cao and Chihhsin Lin, who contribute to the innovative environment at Zing Semiconductor Corporation.

Conclusion

Liying Liu's advancements in temperature detection technology exemplify the impact of innovative thinking in the semiconductor industry. His patents not only improve efficiency but also contribute to cost reduction in manufacturing processes.