Shanghai, China

Liwei Shen

This inventor holds 4 USPTO granted patents and 1 published patent application. Top assignees: Shanghai Eastsoft Microelectronics Co., Ltd., Carl Zeiss Microscopy Gmbh. Active years: 2017-2023.

USPTO Granted Patents = 4 

% Patents Active = 100.0

Average Co-Inventor Count = 3.2

ph-index = 1


Company Filing History:


Years Active: 2017-2023

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4 patents (USPTO):Explore Patents

Title: Innovations of Inventor Liwei Shen

Introduction

Liwei Shen is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of technology, particularly in methods related to signal processing and microscopy. With a total of 4 patents to his name, his work continues to influence advancements in these areas.

Latest Patents

Liwei Shen's latest patents include a method and device for estimating carrier frequency offset. This invention provides a systematic approach to determining a target area for a phase discrimination signal, allowing for effective compensation of carrier frequency offsets. Another notable patent is a method for generating fluorescent photographs using a fluorescence microscope. This method enhances the efficiency of capturing fluorescent images while minimizing the risk of sample bleaching.

Career Highlights

Throughout his career, Liwei Shen has worked with notable companies such as Shanghai Eastsoft Microelectronics Co., Ltd. and Carl Zeiss Microscopy GmbH. His experience in these organizations has allowed him to develop and refine his innovative ideas, contributing to the advancement of technology in his field.

Collaborations

Liwei Shen has collaborated with esteemed colleagues, including Song Pan and Guangsheng Chen. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Liwei Shen's contributions to innovation and technology are noteworthy. His patents reflect a commitment to advancing methods in signal processing and microscopy. As he continues to innovate, his work will undoubtedly have a lasting impact on the industry.

Profile summary based on public USPTO records.
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