Liusha Qin

Title: Liusha Qin: Innovator in Semiconductor Technology

Introduction

Liusha Qin is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on developing advanced mask patterns that are essential for forming semiconductor structures.

Latest Patents

Liusha Qin's latest patents include innovative designs for mask patterns used in semiconductor fabrication. The first patent describes a mask pattern that consists of a first mask pattern and a second mask pattern. The first mask pattern features a plurality of first target patterns arranged along a specific direction. Similarly, the second mask pattern includes a plurality of second target patterns arranged in the same direction. Notably, when these two mask patterns overlap, one of the first target patterns partially overlaps a corresponding second target pattern. His second patent expands on this concept, detailing a mask pattern, a semiconductor structure, and a method for forming the semiconductor structure, emphasizing the importance of the overlapping target patterns in the fabrication process.

Career Highlights

Liusha Qin has worked with leading companies in the semiconductor industry, including Semiconductor Manufacturing International Corporation in both Beijing and Shanghai. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in semiconductor technology.

Collaborations

Throughout his career, Liusha has collaborated with notable colleagues such as Qiang Shu and Yingchun Zhang. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Liusha Qin is a key figure in the semiconductor industry, with a focus on innovative mask patterns that enhance semiconductor fabrication. His contributions and collaborations continue to shape the future of technology in this field.