Santa Clara, CA, United States of America

Lisa Michelle Mandrell

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Lisa Michelle Mandrell. Retrieved from https://idiyas.com/inventor/lisa-michelle-mandrell

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Lisa Michelle Mandrell and Thin-Film Innovation.

Introduction

Lisa Michelle Mandrell is an inventor based in Santa Clara, California, and is associated with Applied Materials, Inc. Her work includes methods for forming metal-containing films for electronic devices.

Latest Patents

Mandrell is named on one patent, titled “Methods of Growing Metal-Containing Films.” The patent describes methods for forming metal-containing films in electronic devices, including logic and memory devices, and for reducing the equivalent oxide thickness penalty. The disclosed process exposes a substrate surface to a metal precursor, such as titanium chloride, a reducing agent, such as a cyclic 1,4-diene, and ammonia. These materials may be introduced simultaneously, partially simultaneously, or separately and sequentially. Mandrell’s patent portfolio includes 1 patent.

Career Highlights

Mandrell’s patent work addresses thin-film formation processes relevant to electronic-device manufacturing. Her disclosed methods focus on controlling film growth while helping reduce an equivalent oxide thickness penalty.

Collaborations

Mandrell’s listed coworkers include Haoming Yan and Shih Chung Chen. Her work is associated with Applied Materials, Inc.

Conclusion

Lisa Michelle Mandrell’s patent describes approaches to metal-containing film formation that support the development and manufacturing of electronic devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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