Aussonne, France

Lionel Marmie

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Lionel Marmie. Retrieved from https://idiyas.com/inventor/lionel-marmie

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: The Innovations of Lionel Marmie

Introduction

Lionel Marmie is a notable inventor based in Aussonne, France. He has made significant contributions to the field of semiconductor technology. His work focuses on improving the efficiency and effectiveness of wafer implantation processes.

Latest Patents

Lionel Marmie holds a patent for a "Method and apparatus for implanting semiconductor wafer substrates." This invention features a gripper designed for loading wafers onto an implant wheel and removing them from the wheel. The gripper includes a substrate engaging mechanism that allows for the rotation of the substrate, enabling wafers to be removed from the implant wheel, rotated to a second orientation, and replaced without leaving the process chamber. He has 1 patent to his name.

Career Highlights

Marmie is currently employed at Applied Materials, Inc., a leading company in the semiconductor manufacturing industry. His role involves developing innovative solutions that enhance the performance of semiconductor devices. His expertise in this area has positioned him as a valuable asset to his team.

Collaborations

Throughout his career, Lionel has collaborated with several talented individuals, including Peter I Edwards and Richard H Cooke. These collaborations have contributed to the advancement of technology in the semiconductor field.

Conclusion

Lionel Marmie's contributions to semiconductor technology through his innovative patent and collaborative efforts highlight his importance in the industry. His work continues to influence the development of efficient manufacturing processes for semiconductor devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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