Le Val Saint Germain, France

Lionel Le Gouezigou

This inventor holds 3 USPTO granted patents. Top assignees: Alcatel N.v., Alcatel. Active years: 1994-2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Lionel Le Gouezigou. Retrieved from https://idiyas.com/inventor/lionel-le-gouezigou

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.8

ph-index = 3

Forward Citations = 11(Granted Patents)


Location History:

  • Le Val St Germain, FR (1995)
  • Le Val Saint Germain, FR (1994 - 2000)

Company Filing History:


Years Active: 1994-2000

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3 patents (USPTO):Explore Patents

Title: Innovations of Lionel Le Gouezigou

Introduction

Lionel Le Gouezigou is a notable inventor based in Le Val Saint Germain, France. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on innovative methods for fabricating semiconductor components, which have implications for various electronic applications.

Latest Patents

One of his latest patents is a method of fabricating semiconductor components. This method includes at least one step of etching an upper layer formed on a substrate. Prior to forming the upper layer, a set of marker layers separated by intermediate layers of predetermined thicknesses is grown. The marker layers and adjacent intermediate layers have different refractive indices. During the etching process, refractive index discontinuities are detected optically, and etching is stopped when the sequence of optically detected discontinuities corresponds to a reference sequence representative of the thicknesses of the intermediate layers.

Another significant patent involves the method of forming a metal contact on a projection on a semiconductor. In this process, a metal contact is formed by etching a metal film that is locally protected by a spot of photosensitive resin. The resin is then caused to flow in the presence of vapor of a solvent, forming a protective spot of increased size. This larger spot allows for the etching of the semiconductor substrate while ensuring that the projection is automatically aligned relative to the metal contact. The resin remains photosensitive, enabling subsequent etching. This invention is particularly applicable to the manufacture of avalanche diodes.

Career Highlights

Lionel has worked with prominent companies in the telecommunications and technology sectors, including Alcatel N.V. and Alcatel. His experience in these organizations has contributed to his expertise in semiconductor technologies and innovations.

Collaborations

Throughout his career, Lionel has collaborated with notable professionals in the field, including Francis Poingt and Christophe Starck. These collaborations have likely enriched his work and led to advancements in semiconductor fabrication techniques.

Conclusion

Lionel Le Gouezigou is a distinguished inventor whose contributions to semiconductor technology are noteworthy. His innovative patents and collaborations reflect his commitment to advancing the field. His work continues to influence the development of electronic components and systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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