This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Visera Technologies Company Limited. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Linya Tseng and an Asymmetric Exposure Mask
Introduction
Linya Tseng is an inventor associated with Zhubei, Taiwan, and Visera Technologies Company Limited. Her patent work includes an exposure mask designed to define pattern profiles using asymmetrically arranged mask patterns.
Latest Patents
Tseng is listed as an inventor on 1 patent, titled “Exposure mask.” The invention describes a mask with multiple pattern blocks, each containing pattern units with mask patterns arranged asymmetrically. The mask may be a binary exposure mask intended to form pattern profiles with curved surfaces.
Career Highlights
Tseng’s recorded patent contribution focuses on exposure-mask design and the arrangement of patterns used to define profiles. The available information associates her with Visera Technologies Company Limited.
Collaborations
Tseng is listed alongside Jyun-You Lu, a woman, as a coworker associated with the patent information provided.
Conclusion
Linya Tseng’s documented invention concerns an exposure mask that uses asymmetric pattern arrangements to create defined profiles, including profiles with curved surfaces.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile