The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2026
Filed:
Feb. 03, 2021
Applicant:
Visera Technologies Company Limited, Hsin-Chu City, TW;
Inventors:
Yueh-Ching Cheng, Hsinchu City, TW;
Linya Tseng, Zhubei City, TW;
Jyun-You Lu, Tianzhong Township, Changhua County, TW;
Assignee:
VisEra Technologies Company Limited, Hsin-Chu City, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 1/38 (2012.01); G03F 1/80 (2012.01); G03F 7/24 (2006.01);
U.S. Cl.
CPC ...
G03F 1/38 (2013.01); G03F 1/80 (2013.01); G03F 7/24 (2013.01);
Abstract
An exposure mask is provided. The exposure mask includes a plurality of pattern blocks for defining a plurality of pattern profiles. Each pattern block includes a plurality of pattern units having mask patterns, and the mask patterns are formed in an asymmetric arrangement. The exposure mask may be a binary exposure mask for forming pattern profiles with curved surfaces.