Lingyu Kong

Title: Innovations of Inventor Lingyu Kong

Introduction

Lingyu Kong is an accomplished inventor based in Urbana, IL (US). He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique method in metal-assisted chemical etching.

Latest Patents

Lingyu Kong holds a patent for a method titled "Self-anchored catalyst metal-assisted chemical etching." This method involves forming an array of discrete metal features on a semiconductor structure. Each metal feature consists of a porous metal body with numerous pores extending through it, terminating at the semiconductor surface. The semiconductor is then exposed to an etchant, causing the metal features to sink into the structure as metal-covered regions are etched. Uncovered regions are extruded through the pores, creating anchoring structures that prevent detouring or delamination during the etching process. Over time, these anchoring structures are gradually removed, resulting in an array of holes in the semiconductor.

Career Highlights

Lingyu Kong is affiliated with the University of Illinois, where he continues to advance his research and innovations. His work has garnered attention for its potential applications in various semiconductor technologies.

Collaborations

Lingyu collaborates with notable colleagues, including Xiuling Li and Jeong Dong Kim, who contribute to his research endeavors.

Conclusion

Lingyu Kong's innovative approach to metal-assisted chemical etching exemplifies the impact of research in semiconductor technology. His contributions are paving the way for advancements in the field.