Yamanashi, Japan

Lingxin Jiang

This inventor holds 2 USPTO granted patents and 4 published patent applications. Top assignee: Tokyo Electron Limited. Active years: 2025-2026.

USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025-2026

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2 patents (USPTO):Explore Patents

Title: Innovations by Lingxin Jiang

Introduction

Lingxin Jiang is a notable inventor based in Yamanashi, Japan. He has made significant contributions to the field of substrate transfer technology. With a total of 2 patents to his name, Jiang's work focuses on enhancing the efficiency and functionality of substrate transfer devices.

Latest Patents

Jiang's latest patents include a substrate transfer device and a power supply method for substrate transfer devices. The substrate transfer device features a tile part that forms a moving surface for substrate transfer, equipped with multiple first coils generating a magnetic field. This innovative design allows a substrate transfer module, which includes magnets and a substrate holder, to move above the surface using magnetic levitation. The power supply method enables wireless power supply to devices within the substrate transfer module during movement, showcasing Jiang's commitment to advancing technology in this area.

Career Highlights

Lingxin Jiang is currently employed at Tokyo Electron Limited, a leading company in the semiconductor industry. His work at the company has been instrumental in developing advanced substrate transfer technologies that are crucial for semiconductor manufacturing processes.

Collaborations

Jiang has collaborated with notable colleagues such as Tsukasa Chida and Toshiaki Kodama. Their combined expertise has contributed to the successful development of innovative technologies in substrate transfer.

Conclusion

Lingxin Jiang's contributions to substrate transfer technology through his patents and work at Tokyo Electron Limited highlight his role as a key innovator in the field. His advancements continue to influence the semiconductor industry positively.

Profile summary based on public USPTO records.
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