Lingfeng Wang

Title: Lingfeng Wang and In-Situ Characterization of Chemical Vapor Deposition

Introduction

Lingfeng Wang is an inventor associated with Zhejiang University in Hangzhou, China. His patent work addresses real-time characterization of chemical vapor deposition (CVD), a process used to deposit materials under controlled conditions. The supplied information lists 1 patent for Wang.

Latest Patents

Wang is named on the patent “Absorption Spectrum-Based Chemical Vapor Deposition Online In-Situ Characterization System and Method.” The invention combines an absorption spectrum detection device, a spectrum movement and optical path calibration device, and a tubular CVD device.

By modifying the tubular CVD setup and incorporating environmental compensation, the system is designed to measure the deposition process accurately under high-temperature and low-pressure conditions. Its real-time measurements can track changes in a sample or reaction system over time and help assess how temperature and pressure affect those changes. Automatic optical-path calibration also enables measurements at different positions within the quartz tube, supporting identification of a sample’s growth window and suitable deposition conditions.

Career Highlights

The available information connects Wang’s patent activity with Zhejiang University. His listed invention focuses on improving process monitoring and helping researchers determine conditions for material deposition.

Collaborations

Rong Xiang and Yicheng Ma are identified as Wang’s coworkers. The supplied information does not specify their roles in the patent or the nature of their collaboration.

Conclusion

Lingfeng Wang’s listed patent presents an approach to real-time, in-situ CVD monitoring that combines absorption spectroscopy, environmental compensation, and optical-path calibration to support process analysis and deposition optimization.