Edison, NJ, United States of America

Lin Zhang

This inventor holds 2 USPTO granted patents and 1 published patent application and 1 EPO patent. Top assignees: Az Electronic Materials USA Corp., Merck Patent Gmbh. Active years: 2013-2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Lin Zhang. Retrieved from https://idiyas.com/inventor/lin-zhang-wv41oh3c

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 100.0

 

Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 2013-2015

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2 patents (USPTO):Explore Patents

Title: Lin Zhang - Innovator in Coating Compositions

Introduction

Lin Zhang is a notable inventor based in Edison, NJ, who has made significant contributions to the field of coating compositions. With a total of two patents to his name, he has focused on developing innovative solutions that enhance the performance of materials used in various applications.

Latest Patents

Lin Zhang's latest patents include advancements in developable bottom antireflective coating compositions. These compositions are designed to improve the efficiency and effectiveness of optical materials, making them crucial for various technological applications.

Career Highlights

Throughout his career, Lin Zhang has worked with prominent companies such as Az Electronic Materials USA Corp. and Merck Patent GmbH. His experience in these organizations has allowed him to refine his expertise in the development of advanced coating technologies.

Collaborations

Lin Zhang has collaborated with talented individuals in his field, including Francis Michael Houlihan and Meng Li. These partnerships have contributed to the successful development of his innovative patents.

Conclusion

Lin Zhang's work in coating compositions showcases his dedication to innovation and his impact on the industry. His contributions continue to influence advancements in material science and technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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