Shanghai, China

Lin Nan Li


Average Co-Inventor Count = 2.8

ph-index = 4

Forward Citations = 37(Granted Patents)


Location History:

  • Hsinchu, TW (2021)
  • Shanghai, CN (2015 - 2023)

Company Filing History:


Years Active: 2015-2023

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16 patents (USPTO):

Title: Lin Nan Li: Innovator in Image Processing Technology

Introduction

Lin Nan Li is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of image processing, particularly in the context of semiconductor manufacturing. With a total of 16 patents to his name, Li has established himself as a key figure in technological innovation.

Latest Patents

One of Lin Nan Li's latest patents is focused on a transfer robot and an image processing method and device for Critical Dimension Scanning Electron Microscopy (CDSEM). This invention provides a sophisticated image processing method for CDSEM, which is essential for determining the measuring range of an image of a target pattern measured by a CDSEM machine. The method involves obtaining a first gray scale image based on the target pattern, performing a Fourier transform to derive a frequency spectrum distribution, filtering out certain frequency spectrum components, and ultimately determining the measuring range based on the refined frequency spectrum distribution.

Career Highlights

Throughout his career, Lin Nan Li has worked with esteemed organizations such as the Chinese Academy of Sciences and Koninklijke Philips Corporation. His work in these institutions has allowed him to develop and refine his innovative ideas, contributing to advancements in technology.

Collaborations

Lin has collaborated with notable colleagues, including Lei Hou and Zhiyuan Wu. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Lin Nan Li's contributions to image processing technology and his impressive portfolio of patents highlight his role as a leading inventor in the field. His work continues to influence advancements in semiconductor manufacturing and image analysis.

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