Lin-Chin Su

Title: Innovations by Lin-Chin Su: Pioneering Advances in DRAM Technology

Introduction

Lin-Chin Su, a prominent inventor based in Taipei Hsien, Taiwan, has made significant contributions to the field of semiconductor technology. With five patents to his name, Su's work particularly focuses on advancements in the fabrication of trench-capacitor DRAM devices.

Latest Patents

Among Lin-Chin Su's latest innovations is a patent for an "Overlay alignment mark and alignment method for the fabrication of trench-capacitor DRAM devices." This invention introduces a small-size alignment mark (with a width of less than 0.5 micrometers) that utilizes a 'k1 process.' This method is designed to enhance the accuracy of AA-DT and GC-DT overlay alignment, which is crucial for the precise manufacturing of trench-capacitor DRAM devices. The 'k1 process' allows for the etching away of polysilicon from the alignment mark trenches to refresh the trench profile, thereby improving overlay alignment accuracy and precision. Another similar patent by Su focuses on AA-DT alignment, utilizing the same innovative processes to ensure wafer alignment precision during production.

Career Highlights

Lin-Chin Su is currently employed with Nan Ya Technology Corporation, a company known for its involvement in advanced semiconductor manufacturing. His contributions throughout his career have led to substantial developments in DRAM technology, making his work essential to the advancement of this critical area in electronics.

Collaborations

Collaboration is key in innovation, and Lin-Chin Su has worked closely with notable colleagues including Tzu-Ching Tsai and An-Hsiung Liu. Together, they have been instrumental in driving advancements within their field, leveraging their collective expertise to foster technological improvements.

Conclusion

Lin-Chin Su's inventions and patents represent significant strides in the enhancement of trench-capacitor DRAM devices. His commitment to innovation continues to impact the semiconductor industry, showcasing the importance of precision in technology manufacturing. As advancements in DRAM technology evolve, the contributions of inventors like Lin-Chin Su will remain vital.