The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 2000
Filed:
Oct. 16, 1998
Applicant:
Inventors:
Lin-Chin Su, Taipei Hsien, TW;
Tzu-Ching Tsai, Taichung Hsien, TW;
Miin-Jiunn Jiang, Taipei, TW;
Hung-Chang Liao, Taipei Hsien, TW;
Jim Wang, Taipei, TW;
Chung Min Lin, Taipei, TW;
Assignee:
Nanya Technology Corp., , TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ; H01L / ;
U.S. Cl.
CPC ...
438297 ; 438431 ; 438439 ; 438446 ; 438692 ;
Abstract
A method for fabricating LOCOS isolation having a planar surface. The method utilizes a polysilicon spacer to prevent bird beak. The method adds the steps of forming a polishing stop layer and removing said edge-protrusion portion of the local oxide by chemical mechanical polishing.