This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignees: Semiconductor Manufacturing International (Beijing) Corporation, Semiconductor Manufacturing International (Shanghai) Corporation. Active years: 2019.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2019
Title: Lin Bo Shi: Innovator in Wafer Bonding Technologies
Introduction
Lin Bo Shi is a prominent inventor based in Shanghai, China. He is known for his contributions to the field of semiconductor technology, particularly in wafer bonding methods. With a focus on innovative solutions, Lin has made significant strides in enhancing the efficiency and effectiveness of wafer-bonded structures.
Latest Patents
Lin Bo Shi holds a patent for "Wafer bonding methods and wafer-bonded structures." This patent describes a method that includes providing a first wafer with a first wafer surface, forming a first metal layer on that surface, and creating a first annular retaining wall structure. The method further involves bonding this first metal layer to a second metal layer formed on a second wafer. This innovative approach aims to improve the reliability and performance of semiconductor devices.
Career Highlights
Throughout his career, Lin has worked with notable companies in the semiconductor industry. He has been associated with Semiconductor Manufacturing International Corporation in both Beijing and Shanghai. His experience in these leading firms has allowed him to develop and refine his expertise in wafer bonding technologies.
Collaborations
Lin has collaborated with esteemed colleagues such as Jin Cheng and Fu Cheng Chen. These partnerships have contributed to the advancement of semiconductor technologies and have fostered a collaborative environment for innovation.
Conclusion
Lin Bo Shi's work in wafer bonding methods exemplifies the spirit of innovation in the semiconductor industry. His contributions continue to influence the development of advanced technologies that are essential for modern electronics.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile