Company Filing History:
Years Active: 2014-2017
Title: Liming Yang: Innovator in Semiconductor Etching Technologies
Introduction
Liming Yang is a prominent inventor based in San Jose, CA, known for his contributions to semiconductor manufacturing technologies. He holds a total of 3 patents that focus on advanced etching methods for dielectric materials and semiconductor applications. His work has significantly impacted the efficiency and precision of semiconductor fabrication processes.
Latest Patents
One of Liming Yang's latest patents is titled "Highly selective etching methods for etching dielectric materials." This patent describes methods for forming high aspect ratio features using an etch process. The method involves supplying an etching gas mixture during a first mode to etch a portion of a dielectric layer while forming a passivation protection in the dielectric layer. The process is repeated to form features in the dielectric layer until the substrate surface is exposed.
Another notable patent is "High aspect ratio plasma etch for 3D NAND semiconductor applications." This patent provides methods for forming features in a film stack to create stair-like structures with accurate profile control. The method utilizes synchronized RF pulses to etch a material layer disposed on a substrate, enhancing the manufacturing of three-dimensional stacking of semiconductor chips.
Career Highlights
Liming Yang is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His innovative work in etching technologies has positioned him as a key contributor to advancements in semiconductor manufacturing.
Collaborations
Throughout his career, Liming has collaborated with notable colleagues, including Gene S. Lee and Byungkook Kong. These collaborations have further enriched his research and development efforts in the field of semiconductor technologies.
Conclusion
Liming Yang's contributions to semiconductor etching technologies demonstrate his expertise and innovative spirit. His patents reflect a commitment to advancing the efficiency and precision of semiconductor manufacturing processes.