The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 2014
Filed:
Sep. 20, 2010
Gene H. Lee, San Jose, CA (US);
Chansyun David Yang, San Jose, CA (US);
Liming Yang, San Jose, CA (US);
Gene H. Lee, San Jose, CA (US);
Chansyun David Yang, San Jose, CA (US);
Liming Yang, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Methods and apparatus for controlling microloading, such as within cell microloading between adjacent cells or isolated/dense microloading between areas of isolated or dense features during shallow trench isolation (STI) fabrication processes, or other trench fabrication processes, are provided herein. In some embodiments, a method for fabricating STI structures may include providing a substrate having a patterned mask layer formed thereon corresponding to one or more STI structures to be etched; etching the substrate through the patterned mask layer using a plasma formed from a process gas to form one or more STI structure recesses on the substrate; and pulsing the plasma for at least a portion of etching the substrate to control at least one of a depth or width of the one or more STI structure recesses.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile