Lim Boon Leong

Title: Innovations by Lim Boon Leong: A Look at His Sputtering Shield Patent

Introduction: Lim Boon Leong is a notable inventor based in Singapore who has made significant contributions to the field of sputtering technology. With one patent to his name, he has developed innovative solutions aimed at enhancing the efficiency of sputtering apparatuses.

Latest Patents: Lim's patent revolves around a sputtering shield designed for sputtering apparatuses. This patent includes a sputtering cathode and a target that overlies the sputtering cathode. The unique feature of his invention is the shield that overlays the target, forming an aperture specifically configured to direct sputtering particles onto a substrate. The design consists of a lower shield portion, a channel outlet, and an upper shield portion that facilitates optimal plasma confinement. Furthermore, his shield comprises a first and second shield, with the first featuring a front gas injection outlet, while the second forms the aperture and is operable to adjust plasma confinement.

Career Highlights: Lim Boon Leong is currently employed at Seagate Technology Incorporated, a leading global data storage solutions company. His work on the sputtering shield patent reflects his commitment to advancing technologies in sputtering, contributing to the ongoing developments in storage solutions.

Collaborations: Within his professional journey, Lim collaborates with esteemed colleagues, including Stan Kassela and Wei Xu. Their combined efforts have fostered an environment of innovation and creativity, enhancing the scope and impact of their research and inventions.

Conclusion: Lim Boon Leong stands out as a significant inventor in the field of sputtering technology. His innovative patent on the sputtering shield showcases his capability to influence advancements in data storage solutions. Through his collaboration with experts in his field and his work at Seagate Technology Incorporated, he continues to push the boundaries of technology and innovation.