This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: Wuhan Xinxin Semiconductor Manufacturing Co., Ltd.. Active years: 2026.
Company Filing History:
Years Active: 2026
Title: Liliang Gu: Innovator in Semiconductor Technology
Introduction
Liliang Gu is a prominent inventor based in Wuhan, China. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique semiconductor device and its fabrication method.
Latest Patents
Liliang Gu holds a patent for a semiconductor device and method of fabricating the same. This invention focuses on a substrate with a reference direction that is parallel to a first or second crystallographic direction. A patterned hard mask layer is strategically distributed along the first crystallographic direction. The invention addresses substrates with notches oriented in different crystallographic directions, utilizing the patterned mask layer as a mask for forming trenches in the substrate surface. Each trench, when viewed normal to a cross-section perpendicular to the substrate, has a cross-sectional width that decreases from the substrate surface toward the inside of the substrate. This design enhances light absorption and conversion efficiency. The method of forming trenches through wet etching helps avoid increased dark current, which can occur due to damage from dry etching processes. This innovation effectively improves dark current performance.
Career Highlights
Liliang Gu is associated with Wuhan Xinxin Semiconductor Manufacturing Co., Ltd., where he continues to advance semiconductor technologies. His work has garnered attention for its practical applications and potential impact on the industry.
Collaborations
Liliang Gu collaborates with various professionals in the field, including his coworker Fan Yang. Their combined expertise contributes to the ongoing development of innovative semiconductor solutions.
Conclusion
Liliang Gu's contributions to semiconductor technology exemplify the spirit of innovation. His patented methods and devices are paving the way for advancements in the industry. His work not only enhances efficiency but also addresses critical challenges in semiconductor fabrication.