Lihui Wen

Title: **Innovations by Lihui Wen: Pioneering Gas Phase Etching Technologies**

Introduction

Lihui Wen, an accomplished inventor based in Beijing, China, has made significant contributions to the field of microelectronics with his innovative inventions. With a total of two patents to his name, he has been instrumental in advancing technologies that enhance the efficiency and precision of substrate processing.

Latest Patents

Lihui Wen's latest patents include a gas phase etching device and a gas phase etching apparatus. The gas phase etching device features a reaction chamber body that defines a space for conducting the etching process. Central to the device is a pedestal that holds the workpiece and is equipped with an inlet member to introduce etchants into the chamber. Additionally, a pressure regulating assembly ensures optimal pressure levels inside the reaction chamber, while two temperature controllers maintain specific temperature requirements. The first temperature is designed to prevent corrosion within the chamber, whereas the second temperature ensures the workpiece is prepared for subsequent processes.

Another notable patent focuses on a hot plate and substrate processing equipment. The invention incorporates a central sub hot plate surrounded by at least one outer ring sub hot plate, with thermal insulation parts strategically positioned to reduce heat conduction between them. This innovation effectively compensates for heat losses in the edge region of the substrate, maintaining a consistent heating rate across all areas.

Career Highlights

Lihui Wen is currently affiliated with Beijing Naura Microelectronics Equipment Co., Ltd., where his research and development efforts continue to push the boundaries of substrate processing technology. His inventions are poised to meet the growing demands of the microelectronics industry.

Collaborations

Throughout his career, Lihui Wen has collaborated with several talented individuals, including Mengxin Zhao and Xu Bin Liu. These partnerships have facilitated the exchange of ideas and fostered innovative solutions within their field.

Conclusion

Lihui Wen's innovative spirit and dedication to advancing technology in microelectronics have led to significant inventions that address critical challenges in substrate processing. His contributions not only reflect his capabilities as an inventor but also set the stage for future developments in the industry.