This inventor holds 1 USPTO granted patent. Top assignee: Nanchang University. Active years: 2023.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2023
Title: Lihuan Liu: Innovator in Plasma Measurement Technology
Introduction
Lihuan Liu is a prominent inventor based in Nanchang, China. He has made significant contributions to the field of plasma measurement technology. His innovative approach has led to the development of a unique method for measuring the ion nonextensive parameter of plasma.
Latest Patents
Lihuan Liu holds a patent titled "Method for measuring plasma ion nonextensive parameter." This invention describes a method that utilizes nonextensive statistical mechanics to measure the ion nonextensive parameter of plasma. The process involves several steps, including obtaining equations that relate geodesic acoustic mode frequency to ion acoustic speed, collecting measurement data, and numerically solving for the ion nonextensive parameter. This invention addresses a critical gap in the diagnosis of ion nonextensive parameters, complementing existing methods for measuring electron nonextensive parameters.
Career Highlights
Lihuan Liu is affiliated with Nanchang University, where he continues to advance research in plasma physics. His work has garnered attention for its innovative approach and practical applications in the field. Liu's dedication to research and development has positioned him as a key figure in his area of expertise.
Collaborations
Lihuan Liu has collaborated with notable colleagues, including Huibin Qiu and Zuozhi Hu. These partnerships have contributed to the advancement of research and innovation in plasma measurement technologies.
Conclusion
Lihuan Liu's contributions to the field of plasma measurement technology exemplify the impact of innovative thinking in scientific research. His patented method for measuring ion nonextensive parameters represents a significant advancement in the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile