Lihua Ding

Title: Lihua Ding: Innovator in Semiconductor Technology

Introduction

Lihua Ding is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on innovative methods for fabricating semiconductor structures, which are crucial for modern electronic devices.

Latest Patents

Lihua Ding's latest patents include a semiconductor structure and a fabrication method thereof. The first patent describes a method that involves providing a to-be-etched layer, forming a first pattern material layer, and creating doped regions using a sacrificial layer as a mask. The second patent outlines a method for fabricating a semiconductor structure that includes forming a dielectric layer and an optical auxiliary layer to enhance the levelness-detecting process during fabrication.

Career Highlights

Throughout his career, Lihua Ding has worked with notable companies in the semiconductor industry, including Semiconductor Manufacturing International Corporation in Shanghai and Beijing. His expertise in semiconductor technology has positioned him as a key player in the field.

Collaborations

Lihua has collaborated with several professionals in his field, including Yafeng Qian and Ying Nan Li, who is a talented woman in the semiconductor sector. These collaborations have further enriched his work and contributed to advancements in semiconductor technology.

Conclusion

Lihua Ding's innovative contributions to semiconductor technology and his collaborative efforts with industry professionals highlight his importance in the field. His patents reflect a commitment to advancing semiconductor fabrication methods, which are essential for the future of electronics.