Singapore, Singapore

Liangxing Lu

This inventor holds 1 USPTO granted patent. Top assignee: Agency for Science, Technology and Research. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Liangxing Lu. Retrieved from https://idiyas.com/inventor/liangxing-lu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Innovations of Liangxing Lu in Nano-Aperture Fabrication

Introduction

Liangxing Lu is a notable inventor based in Singapore, SG. He has made significant contributions to the field of nanotechnology, particularly in the fabrication of metal films with nanoapertures. His innovative approach has the potential to impact various applications in electronics and materials science.

Latest Patents

Liangxing Lu holds a patent for a method titled "Nano-aperture fabrication using template guided thermal dewetting." This patent describes a process that involves providing a nanopatterned template with a plurality of nanostructures. The method includes depositing a metal film onto the nanopatterned template and utilizing thermally induced dewetting to define nanoapertures in the metal film through diffusion and reflow.

Career Highlights

Liangxing Lu is affiliated with the Agency for Science, Technology and Research, where he continues to explore advancements in nanotechnology. His work is characterized by a commitment to innovation and excellence in research.

Collaborations

Liangxing Lu collaborates with talented individuals such as Joel Kwang Wei Yang and Ying Min Wang. These partnerships enhance the research environment and contribute to the development of cutting-edge technologies.

Conclusion

Liangxing Lu's contributions to nano-aperture fabrication exemplify the importance of innovation in technology. His work not only advances scientific understanding but also paves the way for future developments in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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