The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 06, 2018
Filed:
Oct. 02, 2015
Applicant:
Agency for Science, Technology and Research, Singapore, SG;
Inventors:
Joel Kwang Wei Yang, Singapore, SG;
Ying Min Wang, Singapore, SG;
Mohamed Asbahi, Singapore, SG;
Yong-Wei Zhang, Singapore, SG;
Liangxing Lu, Singapore, SG;
Bharathi Madurai Srinivasan, Singapore, SG;
Assignee:
Agency for Science, Technology and Research, Singapore, SG;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 10/60 (2006.01); C23C 14/16 (2006.01); C23C 14/18 (2006.01); C23C 14/30 (2006.01); C23C 14/58 (2006.01);
U.S. Cl.
CPC ...
C23C 10/60 (2013.01); C23C 14/16 (2013.01); C23C 14/18 (2013.01); C23C 14/30 (2013.01); C23C 14/5806 (2013.01);
Abstract
A method for fabrication of metal film with nanoapertures is provided. The method includes the steps of providing a nanopatterned template including a plurality of nanostructures, depositing of the metal film onto the nanopatterned template, and thermally induced dewetting of the metal film to define the nanoapertures in the metal film by diffusion and reflow of the metal film.