Hangzhou, China

Liang Du

This inventor holds 1 USPTO granted patent. Top assignee: Zhejiang Cheer Technology Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Liang Du. Retrieved from https://idiyas.com/inventor/liang-du-2n6zdi6j

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Liang Du and Immersion Fluid Recovery Technology.

Introduction

Liang Du is an inventor based in Hangzhou, China. His patent work includes technology for recovering immersion fluid in systems used above a substrate.

Latest Patents

Du is associated with 1 patent, titled “Immersion Fluid Recovery System and Immersion Fluid Recovery Method Using Said System.” The invention describes a system with a recovery cavity, a sealing extraction opening, a recovery flow path, a gas-liquid separator, and an orifice plate. The opening extracts immersion fluid from the gap between the apparatus and substrate, as well as gas from the fluid’s radial outer side. The recovery cavity communicates with the opening and gas-liquid separator, while the orifice plate contains through holes smaller than the recovery pipe. Together, these components support the recovery of immersion fluid and gas.

Career Highlights

Du is associated with Zhejiang Cheer Technology Co., Ltd. His patent describes an approach to fluid recovery in an immersion system, with components arranged to manage the extraction and separation of fluid and gas.

Collaborations

The provided information identifies Xin Fu and Youyang Chi as Du’s coworkers. It does not specify their roles in the patent or the extent of their collaboration.

Conclusion

Liang Du’s listed patent focuses on recovering immersion fluid and separating gas in a substrate-processing system, reflecting his documented contribution to this area of invention.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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