This inventor holds 1 USPTO granted patent. Top assignee: Shanghai Micro Electronics Equipment (Group) Co., Ltd.. Active years: 2020.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2020
Title: Innovations of Liandong Pan in Dual-Layer Alignment Technology
Introduction
Liandong Pan is a notable inventor based in Shanghai, China. He has made significant contributions to the field of alignment technology, particularly through his innovative patent. His work focuses on enhancing the precision and efficiency of alignment processes in various applications.
Latest Patents
Liandong Pan holds a patent for a dual-layer alignment device and method. This invention includes a fixed frame, a first measuring device, and a mark plate with a fixed-frame mark. The device also features a motion stage equipped with a reference mark, a motion-stage mark, and a second measuring device. The first measuring device measures the relative positional relationship between the reference mark and the motion-stage mark, while the second measuring device measures the relationship between the reference mark and the fixed-frame mark. This allows for the derivation of a final relative positional relationship, improving alignment accuracy. The motion stage is the only movable component, and the design allows for static calibration of coordinate relationships, enhancing overall calibration accuracy.
Career Highlights
Liandong Pan is associated with Shanghai Micro Electronics Equipment (Group) Co., Ltd. His work at this company has been instrumental in advancing technologies related to microelectronics and precision alignment. He has demonstrated a commitment to innovation and excellence in his field.
Collaborations
Liandong Pan has collaborated with notable colleagues such as Shucun Zhu and Xuchao Zhou. Their combined expertise has contributed to the development of advanced technologies in alignment and measurement.
Conclusion
Liandong Pan's contributions to dual-layer alignment technology exemplify his innovative spirit and dedication to improving precision in engineering applications. His patent reflects a significant advancement in the field, showcasing the importance of collaboration and innovation in driving technological progress.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
