Portland, OR, United States of America

Liam S Roberts


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2005-2023

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2 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Liam S Roberts

Introduction

Liam S Roberts is a notable inventor based in Portland, OR (US), recognized for his contributions to the field of semiconductor technology. With a total of 2 patents, he has made significant advancements that enhance the efficiency and reliability of semiconductor manufacturing processes.

Latest Patents

Roberts' latest patents include a retaining ring designed for the polishing of semiconductor substrates. This retaining ring features a bottom surface that contacts a polishing pad and a top surface that attaches to a carrier head. The top surface is equipped with multiple screw holes and alignment slots, along with a first insert that prevents the insertion of an alignment pin into the first alignment slot. Another significant patent is the substrate retainer wear detection method and apparatus. This innovation allows for the detection of wear in substrate retainers used in chemical mechanical planarization processes. The apparatus is designed to enable a sensor to identify when the wear edge of the retainer has reached a critical threshold, ensuring timely replacement before failure occurs.

Career Highlights

Throughout his career, Liam S Roberts has worked with prominent companies in the semiconductor industry, including Intel Corporation and Applied Materials, Inc. His experience in these organizations has contributed to his expertise and innovative capabilities in the field.

Collaborations

Roberts has collaborated with talented individuals such as Kevin Eduard Heidrich and Eric A Bunn, further enhancing his work and contributions to semiconductor technology.

Conclusion

Liam S Roberts stands out as an influential inventor whose patents have significantly impacted the semiconductor industry. His innovative designs and methods continue to pave the way for advancements in technology.

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