This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: University of California. Active years: 2014.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2014
Title: Innovations by Li-Wen Hung
Introduction
Li-Wen Hung is an accomplished inventor based in Berkeley, CA. She has made significant contributions to the field of materials science, particularly in the development of methods for producing gaps between materials without the use of etchants. Her innovative approach has implications for various applications, including microelectromechanical systems (MEMS) and nanoelectromechanical systems (NEMS).
Latest Patents
Li-Wen Hung holds a patent for "Etchant-free methods of producing a gap between two layers, and devices produced thereby." This patent describes methods that involve providing a structure comprising a first material and a second material. The methods subject the structure to conditions that decrease the volume of at least a portion of one of the materials, resulting in a gap between the two. The patent also covers devices produced by these methods, which can be utilized in advanced technological applications.
Career Highlights
Li-Wen Hung is affiliated with the University of California, where she continues to engage in research and development. Her work has garnered attention for its innovative techniques and potential applications in various fields. With her expertise, she contributes to the advancement of technology and materials science.
Collaborations
Li-Wen Hung collaborates with Clark Tu-Cuong Nguyen, who is also involved in research and development. Their partnership enhances the scope of their projects and fosters innovation in their respective fields.
Conclusion
Li-Wen Hung's contributions to the field of materials science through her innovative patent demonstrate her commitment to advancing technology. Her work continues to inspire future developments in the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
