Li-Tso Huang

Title: Li-Tso Huang and Wafer Processing Innovation

Introduction

Li-Tso Huang is an inventor based in Hsinchu City, Taiwan. He is associated with Grand Process Technology Corporation and is named on 1 patent concerning wafer processing.

Latest Patents

Huang’s patent, “Wafer processing method,” describes a process for soaking and spin-cleaning a wafer using a multifunctional single-wafer immersion and spin-cleaning device. The device includes a spin drive, a wafer turntable, and a wafer receiving tray with a soaking tank. A watertight contact gasket helps seal the wafer against the tray, allowing liquid medicine to accumulate at a suitable level and fully immerse the wafer during soaking. The method also includes steps for positioning and lifting the wafer before and after soaking, followed by spinning and cleaning.

Career Highlights

Huang’s listed patent focuses on integrating immersion and spin cleaning in wafer processing. Its design uses a watertight seal to support controlled soaking within the same device used for spin cleaning.

Collaborations

Huang’s listed coworkers include Hsiu-Kai Chang and Chin-Yuan Wu. His patent work is associated with Grand Process Technology Corporation.

Conclusion

Li-Tso Huang’s patent presents a wafer-processing approach that combines controlled immersion with spin cleaning, highlighting his contribution to semiconductor manufacturing technology.